Uluhlu lweWavelength | : | 190-1100nm |
I-Spectral Bandwidth | : | 2nm (5nm, 4nm, 1nm, 0,5nm ngokuzithandela) |
Ukuchaneka kweWavelength | : | ±0.3nm |
Ukuveliswa kwakhona kweWavelength | : | ≤0.15nm |
Inkqubo yeFotometric | : | Umqa ophindwe kabini, ukuskena okuzenzekelayo, ii-detectors ezimbini |
Ukuchaneka kweFotometric | : | ± 0.3τ (0~100τ) ± 0.002A (0~0.5A) ±0.004A (0.5~1A) |
UkuVeliswa kwakhona kweFotometric | : | ≤0.15%τ |
Imo yokusebenza | : | T, A, C, E |
Uluhlu lweFotometric | : | -0.3-3.5A |
UkuKhanya okulahlekileyo | : | ≤0.05%τ (Nal, 220nm, NaNO2 360nm) |
Isiseko se-Flatness | : | ±0.002A |
Uzinzo | : | ≤0.001A/h (nge-500nm, emva kokufudumala) |
Ingxolo | : | ± 0.001A (nge-500nm, emva kokufudumala) |
Bonisa | : | 6 intshi phezulu ukukhanya blue LCD |
Umtshini | : | Iifoto ze-silicon |
Amandla | : | I-AC 220V/50Hz, 110V/60Hz 180W |
Imilinganiselo | : | 630×470×210mm |
Ubunzima | : | 26kg |
Uluhlu lweWavelength | : | 190-1100nm |
I-Spectral Bandwidth | : | 2nm (5nm, 4nm, 1nm, 0,5nm ngokuzithandela) |
Ukuchaneka kweWavelength | : | ±0.3nm |
Ukuveliswa kwakhona kweWavelength | : | 0.15nm |
Inkqubo yeFotometric | : | I-Split-beam monitoring ratio, i-auto scan, ii-detectors ezimbini |
Ukuchaneka kweFotometric | : | ± 0.3τ (0~100τ) ± 0.002A (0~0.5A) ±0.004A (0.5~1A) |
UkuVeliswa kwakhona kweFotometric | : | 0.2%τ |
Imo yokusebenza | : | T, A, C, E |
Uluhlu lweFotometric | : | -0.3-3A |
UkuKhanya okulahlekileyo | : | ≤0.05%τ (Nal, 220nm, NaNO2 360nm) |
Isiseko se-Flatness | : | ±0.002A |
Uzinzo | : | ≤0.001A/30min (kwi-500nm, emva kokufudumala) |
Ingxolo | : | ± 0.001A (nge-500nm, emva kokufudumala) |
Bonisa | : | 6 intshi phezulu ukukhanya blue LCD |
Umtshini | : | Iifoto ze-silicon |
Amandla | : | I-AC 220V/50Hz, 110V/60Hz 180W |
Imilinganiselo | : | 630×470×210mm |
Ubunzima | : | 26kg |
Uluhlu lweWavelength | : | 190-1100nm |
I-Spectral Bandwidth | : | 2nm (5nm, 1nm, uyazikhethela) |
Ukuchaneka kweWavelength | : | ±0.3nm |
Ukuveliswa kwakhona kweWavelength | : | 0.2nm |
Inkqubo yeFotometric | : | I-beam enye, i-plane grating ye-1200L / mm |
Ukuchaneka kweFotometric | : | ± 0.3τ (0~100τ) ± 0.002A (0~0.5A) ±0.004A (0.5~1A) |
UkuVeliswa kwakhona kweFotometric | : | ≤0.15%τ |
Imo yokusebenza | : | T, A(-0.3-3A), C, E |
Uluhlu lweFotometric | : | -0.3-3A |
UkuKhanya okulahlekileyo | : | ≤0.05%τ (Nal, 220nm, NaNO2 360nm) |
Isiseko se-Flatness | : | ±0.002A |
Uzinzo | : | ≤0.001A/30min (kwi-500nm, emva kokufudumala) |
Ingxolo | : | ± 0.001A (nge-500nm, emva kokufudumala) |
Bonisa | : | 6 intshi phezulu ukukhanya blue LCD |
Umtshini | : | Iifoto ze-silicon |
Amandla | : | I-AC 220V/50Hz, 110V/60Hz 140W |
Imilinganiselo | : | 530×410×210mm |
Ubunzima | : | 18kg |
Uluhlu lweWavelength | : | 320-1100nm |
I-Spectral Bandwidth | : | 2nm (5nm, 1nm, uyazikhethela) |
Ukuchaneka kweWavelength | : | ±0.5nm |
Ukuveliswa kwakhona kweWavelength | : | 0.2nm |
Inkqubo yeFotometric | : | I-beam enye, i-plane grating ye-1200L / mm |
Ukuchaneka kweFotometric | : | ± 0.3τ (0~100τ) ± 0.002A (0~0.5A) ±0.004A (0.5~1A) |
UkuVeliswa kwakhona kweFotometric | : | ≤0.15%τ |
Imo yokusebenza | : | T, A, C, E |
Uluhlu lweFotometric | : | -0.3-3A |
UkuKhanya okulahlekileyo | : | ≤0.05%τ (Nal, 220nm, NaNO2 360nm) |
Isiseko se-Flatness | : | ±0.002A |
Uzinzo | : | ≤0.001A/30min (kwi-500nm, emva kokufudumala) |
Umthombo wokukhanya | : | Isibane se-tungsten halogen |
Bonisa | : | 6 intshi phezulu ukukhanya blue LCD |
Umtshini | : | Iifoto ze-silicon |
Amandla | : | I-AC 220V/50Hz, 110V/60Hz 140W |
Imilinganiselo | : | 530×410×210mm |
Ubunzima | : | 18kg |